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Journal Articles

Optimization of the silicon oxide layer thicknesses inserted in the Mo/Si multilayer interfaces for high heat stability and high reflectivity

Ishino, Masahiko; Yoda, Osamu

Journal of Applied Physics, 92(9), p.4952 - 4958, 2002/11

https://doi.org/10.1063/1.1510566

Times Cited Count：6 Percentile：28.31(Physics, Applied)

no abstracts in English